Photoreactive Polymers: The Science and Technology of Resists
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Type
Book
Authors
ISBN 10
0471855502
ISBN 13
9780471855507
Category
REFERENCE
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Publication Year
1989
Publisher
Pages
409
Tags
Description
Basic mechanisms and applications of photoresist chemistry in semiconductor device manufacturing, lithography, chemical engineering, and the graphic arts are discussed in this book. It gives a balanced view of the subject as it now stands and at the same time promotes an understanding of the perennial challenge of material science to meet the demands of new technology by the successful design of new materials. The presentation of the text follows the history of the subject, and the generic resist systems are described approximately in the order in which they made their appearance. This approach maintains the logic of technical development where a new material emerges in response to some deficiency in its historic precursor. The chapters dealing with the resists are interspersed with sections on the related background in photophysics, radiation chemistry, and image science. The text will be of benefit to engineers, chemists and materials scientists in the semiconductor, graphic arts, and polymer photography industries, and graduate students in chemical engineering and electronics. - from Amzon
Number of Copies
1
Library | Accession No | Call No | Copy No | Edition | Location | Availability |
---|---|---|---|---|---|---|
Main | 10365 | QD 382. P45 R45 1989 | 1 | Yes |